Chemical vapor deposition (CVD) is a process in which films of materials are deposited from the vapor phase by the decomposition of chemicals on the surface of a substrate. Most frequently the process is thermally driven but photo- and plasma-assisted methods are also used. The deposition of the film is controlled by a chemical reaction.
Chemical vapor deposition (CVD) is parent to a family of processes whereby a solid material is deposited from a vapor by a chemical reaction occurring on or in the vicinity of a normally heated substrate surface. The resulting solid material is in the form of a thin film, powder, or single crystal. It is a chemical process that deposits thin film of diverse chemical substances. A substrate is exposed to volatile precursors and react to generate required deposit. By products emissions also generated from the process simultaneously.
Drizgas Tech is the manufacturer of CVD scrubber in India. We have developed a scrubber to capture and treat fumes from CVD process using adsorption technology. Drizgas Tech uses specialized carbon media to get high removal efficiency than the normal carbon media. The saturated carbon can easily disposed in non-hazardous landfills.
The following chemicals can be treated using CVD scrubber. However, the scrubber exhibits different efficiency for different pollutants. Please contact us for further details about efficiency for individual components.