Chemical vapor deposition (CVD) is a process in which films of materials are
deposited from the vapor phase by the decomposition of chemicals on the surface of a
substrate. Most frequently the process is thermally driven but photo- and
plasma-assisted methods are also used. The deposition of the film is controlled by a
chemical reaction.
Chemical vapor deposition (CVD) is parent to a family of processes whereby a solid
material is deposited from a vapor by a chemical reaction occurring on or in the
vicinity of a normally heated substrate surface. The resulting solid material is in
the form of a thin film, powder, or single crystal. It is a chemical process that
deposits thin film of diverse chemical substances. A substrate is exposed to
volatile precursors and react to generate required deposit. By products emissions
also generated from the process simultaneously.
Drizgas Tech is the manufacturer of CVD scrubber in India. We have developed a
scrubber to capture and treat fumes from CVD process using adsorption technology.
Drizgas Tech uses specialized carbon media to get high removal efficiency than the
normal carbon media. The saturated carbon can easily disposed in non-hazardous
landfills.
The following chemicals can be treated using CVD scrubber. However, the scrubber
exhibits different efficiency for different pollutants. Please contact us for
further details about efficiency for individual components.